Photomask reticle having multiple versions of the same mask...

Details Photomask reticle having multiple versions of the same mask... Photomask reticle having multiple versions of the same mask...

2008-07-08

2008-07-08

Rosasco, Stephen (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

Reexamination Certificate

active

10866976

ABSTRACT:
A reticle includes at least two duplicate mask patterns each having a different bias. A reticle according to at least one embodiment of the invention includes a first mask pattern, a second mask pattern and a third mask pattern, each of the first mask pattern, second mask pattern and third mask pattern being duplicates of one another and having a different bias.

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Photronics, Inc.: Photomask & Reticle Lithography Solutions, at http://www.photronics.com/about/basics.jsp, Mar. 2004.

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