Optics: measuring and testing – Inspection of flaws or impurities
Reexamination Certificate
2011-08-30
2011-08-30
Pham, Hoa Q (Department: 2886)
Optics: measuring and testing
Inspection of flaws or impurities
C356S237500, C430S005000
Reexamination Certificate
active
08009285
ABSTRACT:
A resist inspection apparatus is provided which has a configuration in which a reticle is separated from a pellicle. A reticle cassette is made up of two pieces of plate members. A hollowed portion with a shape allowing the reticle to be inserted into the plate member. Another hollowed portion having a shape being slightly larger than that of the resist of the reticle is formed on the plate member. In the circumference of the hollowed portion is placed a pellicle frame on which a protective film is formed in a stretched manner. In the concave portion is housed in the reticle with a resist on the reticle directed toward the hollowed portion. The reticle is put in sealed space.
REFERENCES:
patent: 4697701 (1987-10-01), Ying
patent: 5168993 (1992-12-01), Yen
patent: 5820950 (1998-10-01), Wang
patent: 7300526 (2007-11-01), Hedges et al.
patent: 7316869 (2008-01-01), Eschbach et al.
patent: 2003/0207182 (2003-11-01), Shirasaki
patent: 2004/0012776 (2004-01-01), Bae
patent: 404268557 (1992-09-01), None
patent: 1993216214 (1993-08-01), None
patent: 1994020934 (1994-01-01), None
patent: 2003315983 (2003-11-01), None
patent: 2006245400 (2006-09-01), None
patent: 2001109470 (2001-12-01), None
patent: 2007030253 (2007-03-01), None
patent: 2007051965 (2007-05-01), None
Korean Office Action for KR10-2008-0130346 dated Dec. 10, 2010.
Hasegawa Ryuji
Igeta Takahiro
Katou Yoshikazu
Moribe Hideyuki
NEC Corporation
Pham Hoa Q
LandOfFree
Photomask mounting/housing device and resist inspection... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Photomask mounting/housing device and resist inspection..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photomask mounting/housing device and resist inspection... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2725150