Photomask mounting/housing device and resist inspection...

Optics: measuring and testing – Inspection of flaws or impurities

Reexamination Certificate

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Details

C356S237500, C430S005000

Reexamination Certificate

active

08009285

ABSTRACT:
A resist inspection apparatus is provided which has a configuration in which a reticle is separated from a pellicle. A reticle cassette is made up of two pieces of plate members. A hollowed portion with a shape allowing the reticle to be inserted into the plate member. Another hollowed portion having a shape being slightly larger than that of the resist of the reticle is formed on the plate member. In the circumference of the hollowed portion is placed a pellicle frame on which a protective film is formed in a stretched manner. In the concave portion is housed in the reticle with a resist on the reticle directed toward the hollowed portion. The reticle is put in sealed space.

REFERENCES:
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patent: 7300526 (2007-11-01), Hedges et al.
patent: 7316869 (2008-01-01), Eschbach et al.
patent: 2003/0207182 (2003-11-01), Shirasaki
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patent: 2006245400 (2006-09-01), None
patent: 2001109470 (2001-12-01), None
patent: 2007030253 (2007-03-01), None
patent: 2007051965 (2007-05-01), None
Korean Office Action for KR10-2008-0130346 dated Dec. 10, 2010.

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