Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Reexamination Certificate
2005-03-15
2005-03-15
Rosasco, S. (Department: 1756)
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
Reexamination Certificate
active
06866969
ABSTRACT:
Provided is a photomask enabling accurate tone representation. This photomask has a transparent substrate (42), and a phase grating structured from a plurality of grooves of a fixed pitch (P) formed on said substrate, wherein at least either the depth or width of the respective grooves of the phase grating is made to bear the exposure pattern. And, when the wavelength of the exposed light of the aligner employing the photomask is set to λ, and the incident side numerical aperture of the imaging system lens is set to NAi, P<λ/NAi. Thereby, the grating will no longer be imaged, and the exposure pattern represented with the depth or width of the respective grooves of the phase grating will be transcribed on to a light sensitive material.
REFERENCES:
patent: 5786116 (1998-07-01), Rolfson
patent: 6057065 (2000-05-01), Rolson
patent: 6379868 (2002-04-01), White
patent: 05-142752 (1993-06-01), None
patent: 05-224398 (1993-09-01), None
Miyamae Akira
Nagasaka Kimio
Harness, Dickey & Pierce P.L.L.C.
Rosasco S.
Seiko Epson Corporation
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