Photomask, method of lithography, and method for...

Details Photomask, method of lithography, and method for... Photomask, method of lithography, and method for...

2008-12-10

2011-11-29

Nguyen, Hung Henry (Department: 2882)

Photocopying

Projection printing and copying cameras

Methods

C430S030000

Reexamination Certificate

active

08068213

ABSTRACT:
A photomask has a monitoring pattern configured to obtain information required for adjusting optical system of a projection lithography tool. The monitoring pattern encompasses a mask substrate and an asymmetrical diffraction grating delineated on the mask substrate, configured to generate a positive first order diffracted light and a negative first order diffracted light in different diffraction efficiencies. The asymmetrical diffraction grating includes a plurality of probing-phase shifters, disposed periodically on the mask substrate in parallel, and a plurality of opaque strips disposed on light-shielding faces of the probing-phase shifters. An asymmetrically recessed ridge implements each of the probing-phase shifters.

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