Photomask, method for detecting pattern defect of the same,...

Details Photomask, method for detecting pattern defect of the same,... Photomask, method for detecting pattern defect of the same,...

2006-05-22

2008-05-13

Young, Christopher G. (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Including control feature responsive to a test or measurement

C430S312000, C382S144000, C382S145000

Reexamination Certificate

active

07371489

ABSTRACT:
There exist a pattern-dense region where patterns having an F-letter shape are dense and a pattern-interspersed region where small rectangular dummy patterns are interspersed. In the pattern-interspersed region, the dummy patterns are arranged in a manner that at least one dummy pattern exists in a scan target range of a mask pattern defect inspecting apparatus. With the dummy patterns formed in the pattern-interspersed region at the intervals as described above, when one scan target range is scanned by the mask pattern defect inspecting apparatus, at least one dummy pattern is included in the scan target range in the pattern-interspersed region. Therefore, mix-up of alignment in this range is prevented from occurring, which makes it possible to perform proper defect inspection.

REFERENCES:
patent: 5585210 (1996-12-01), Lee et al.
patent: 5725973 (1998-03-01), Han et al.
patent: 03-018851 (1991-01-01), None
patent: 11-260299 (1999-09-01), None
patent: 2001-141677 (2001-05-01), None
Japanese Office Action mailed Jan. 29, 2008 for JP 2002-224037.

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