Photomask material and process of producing photomask from...

Details Photomask material and process of producing photomask from... Photomask material and process of producing photomask from...

2005-05-31

2005-05-31

Letscher, Geraldine (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

C430S270100, C430S322000, C430S323000, C430S324000

Reexamination Certificate

active

06899980

ABSTRACT:
A photomask material comprising a transmissive substrate and a photosensitive layer formed on a temporary substrate laminated on the transmissive substrate with the photosensitive layer faced to the transmissive substrate and a process of manufacturing a photomask from the photomask material is disclosed. The photosensitive layer is made of a composition comprising at least an alkali-soluble resin binder having a polymerizable unsaturated bond, a monomer having at least one polymerizable unsaturated bond, an photopolymerization initiator sensitive to light of a wavelength longer than 405 nm and a colorant surface-treated with a polymerizable dispersant.

REFERENCES:
patent: 2003/0129504 (2003-07-01), Wakata et al.

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