Photomask material and method for producing same

Details Photomask material and method for producing same Photomask material and method for producing same

1974-11-29

1976-06-08

Smith, Ronald H.

Gas separation: apparatus

Electric field separation apparatus

Electrode retaining or supporting means

96 67, 96 86R, 96 94BF, 204 38A, G03C 178

Patent

active

039619621

ABSTRACT:
A photomask material which comprises a transparent support having thereon an aluminum oxide thin film formed by anodic oxidation, the oxide thin film containing with a uniform distribution over the entire film a number of fine pores having a light-sensitive silver halide therein, and a method for producing the photomask material which comprises providing an aluminum thin layer on a transparent support, anodically oxidizing the aluminum thin layer by contacting the aluminum thin layer with an electrolytic solution such that the rate of anodic oxidation of the aluminum thin layer is continuously reduced in a direction of from one portion of the thin layer to another portion of the thin layer to thereby render the thin layer transparent, and incorporating a light-sensitive silver halide in a number of the resulting fine pores formed in the aluminum oxide thin film and uniformly all over the aluminum oxide thin film.

REFERENCES:
patent: 3346384 (1967-10-01), Gaynor
patent: 3615553 (1971-10-01), Wainer
patent: 3811894 (1974-05-01), Yonezawa
patent: 3874879 (1975-04-01), Rasch

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