Photomask material

Details Photomask material Photomask material

1982-08-06

1985-02-05

Thomas, Alexander S.

Stock material or miscellaneous articles

Composite

Of inorganic material

428699, 428701, 428702, 430 5, 118504, 118505, B32B 1504, B32B 1500

Patent

active

044978782

ABSTRACT:
There is disclosed a photomask material comprising a substrate, and at least one layer containing mixture of a metal oxide and a metal nitride or at least one metal nitride layer provided on the substrate, and the photomask material may comprise a substrate and a mask layer provided on the substrate, the mask layer consisting of a layer containing a lower metal oxide and/or a lower metal nitride, and a layer containing a mixture of a higher oxide and a higher nitride of the same metal or a higher metal nitride layer of the same metal.
The photomask material of the present invention exhibits excellent resistance to the cleaning solutions and can be used repeatedly.

REFERENCES:
patent: 3406043 (1958-10-01), Balde
patent: 3907620 (1975-09-01), Abraham et al.
patent: 4284687 (1981-08-01), Dreyer et al.

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