Photomask material

Details Photomask material Photomask material

1986-01-15

1987-07-07

Kittle, John E.

Stock material or miscellaneous articles

Composite

Of quartz or glass

428632, 430 5, B22B 1500

Patent

active

046787143

ABSTRACT:
A photomask material comprising a transparent glass substrate and a metal silicide film formed on the transparent glass substrate, the rate of a silicon and a metal in the metal silicide film being continuously varied so as to increase the amount of metal toward an upper surface of the metal silicide film.

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