Photomask material

Details Photomask material Photomask material

1985-11-12

1988-02-02

Kittle, John E.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

378 34, 378 35, 428428, 428432, G03F 900, B32B 900, G21K 500

Patent

active

047228784

ABSTRACT:
A photomask material comprising a transparent glass substrate, a polysilicon layer formed on the transparent glass substrate, a transition metal film formed on the polysilicon layer, the metal film being capable of being etched by means of the same dry etching process as that used for the polysilicon layer, and a protective polysilicon layer formed on the transition metal film.

REFERENCES:
patent: 3721584 (1973-03-01), Diem
patent: 4188444 (1980-02-01), Landau
patent: 4237150 (1980-12-01), Wiesmann
patent: 4368230 (1983-01-01), Mizukami et al.
patent: 4393127 (1983-07-01), Greschner et al.
patent: 4440841 (1984-04-01), Tabuchi
patent: 4472237 (1984-09-01), Deslauriers et al.

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