Photomask material

Details Photomask material Photomask material

1986-03-06

1988-11-08

Buffalow, Edith

Stock material or miscellaneous articles

Composite

Of quartz or glass

428428, 428446, 427 38, 148DIG19, 148DIG147, 430 5, B32B 1500

Patent

active

047833718

ABSTRACT:
A silicide film of oxidized transition metal 3 formed on a transparent substrate 1 has a low reflectance and in consequence, a high resolution can be obtained and dry etching thereof can be easily done. In addition, since said silicide film 3 has good adhesion to a transparent substrate 1, fine patterns therein do not peel off at the time of rinsing the mask.

REFERENCES:
patent: 3712816 (1973-01-01), Blome et al.
patent: 4333226 (1982-06-01), Abe et al.
patent: 4425700 (1984-01-01), Sasaki et al.
patent: 4661426 (1987-04-01), Matsuda et al.
patent: 4678714 (1987-07-01), Watakabe

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