Photomask inspection method and inspection tape therefor

Details Photomask inspection method and inspection tape therefor Photomask inspection method and inspection tape therefor

1996-12-23

1998-09-08

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

382144, G03F 900

Patent

active

058043403

ABSTRACT:
A method of inspecting a photomask for use in photolithography which accounts for the rounding of corners of features that occurs during manufacture of the photomask. A data tape used in the preparation of the photomask is first provided. An inspection tape is then prepared by modifying the data on the data tape to account for rounding of the features during preparation of the photomask. Finally, an inspection device is used to compare features on the photomask to data on the inspection tape corresponding to such features.

REFERENCES:
patent: 4962541 (1990-10-01), Doi et al.
patent: 5287290 (1994-02-01), Tabara et al.
patent: 5475766 (1995-12-01), Tsuchiya et al.

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