Optics: measuring and testing – Inspection of flaws or impurities – Surface condition
Patent
1998-02-23
2000-02-08
Kim, Robert H.
Optics: measuring and testing
Inspection of flaws or impurities
Surface condition
3562375, G01N 2188
Patent
active
060233281
ABSTRACT:
A method and apparatus for inspection of masks is disclosed herein. The method comprises exposing a wafer at a large magnification, while maintaining the same intensity profile obtain at standard exposure magnifications. The enlargened image exposed on a wafer is then examined for defects. The apparatus for inspecting masks includes an illumination system, an optical imaging system, and a detecting device. During inspection of the wafer, the enlarged image on the wafer is examined for defects. In evaluating potential defects, an exposed die is compared with another exposed die to determine the location of the defect on the mask. Alternatively, the examination of the image can occur with respect to a pattern of the image on a design database.
REFERENCES:
patent: 5162867 (1992-11-01), Kohno
patent: 5337097 (1994-08-01), Suzuki et al.
patent: 5701174 (1997-12-01), Yeh et al.
patent: 5710624 (1998-01-01), Utamura
Kim Robert H.
Micro)n Technology, Inc.
Smith Zandra V.
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