Photomask inspection apparatus

Details Photomask inspection apparatus Photomask inspection apparatus

1997-08-08

1999-12-14

Mancuso, Joseph

Image analysis

Applications

Manufacturing or product inspection

382145, 348125, G06K 900

Patent

active

060027916

ABSTRACT:
A photomask inspection apparatus includes a photoelectric converting portion, a first comparator, buffer memories, a design data converting portion, and second and third comparators. The photoelectric converting portion converts the respective beams of light having separately scanned adjoining identical unit patterns formed on a photomask into electrical signals. The first comparator compares these electrical signals with each other to find whether there is any inconformity between the unit patterns, and when any inconformity is found, the first comparator outputs coordinate information of the inconformity. The buffer memories store the electrical signals respectively when the inconformity is found by the first comparator. The design data converting portion converts only design data of peripheral coordinates of the coordinate information in the design data stored in the external memory into an inspection signal. The second and third comparators compare the electrical signals from the buffer memories with the inspection signal to identify a photomask pattern having a defect.

REFERENCES:
patent: 5767974 (1998-06-01), Higashiguchi et al.

Affiliated with

Also associated with

Rating

Photomask inspection apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Photomask inspection apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photomask inspection apparatus will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-870899