Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Reexamination Certificate
2005-01-25
2005-01-25
Mohamedulla, Saleha R. (Department: 1756)
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
C382S144000
Reexamination Certificate
active
06846597
ABSTRACT:
A photomask with a dummy pattern is inspected in a predetermined detection sensitivity by using photomask pattern data designating a photomask with a dummy pattern to detect defects in the photomask. Coordinates indicating the positions of the defects are also determined. The defects in a design pattern area and those in a dummy pattern area are discriminated by using defect-discriminating data. The defects in the design pattern area and those in the dummy pattern area are examined on the basis of respective inspection specifications.
REFERENCES:
patent: 5849440 (1998-12-01), Lucas et al.
patent: 6656648 (2003-12-01), Inoue
Machiya Yuji
Nara Hideyuki
Narukawa Syogo
Tomita Tatsuya
Yamazaki Kiyoshi
Dai Nippon Printing Co. Ltd.
Mohamedulla Saleha R.
Parkhurst & Wendel L.L.P.
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