Photomask having alignment marks

Details Photomask having alignment marks Photomask having alignment marks

1993-05-20

1994-12-27

Rosasco, Steve

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

355 53, G03F 900

Patent

active

053764820

ABSTRACT:
A photo mask for detecting misalignment of stepper blades and undesirable pattern array on an wafer comprises: a number of highest limit alignment marks 5 to 8 located in the outside of a field pattern area for forming product dies on the wafer and indicating the highest limits in setting positions of the stepper blades respectively and a number of lowest alignment marks 9,10 and 11 located respectively in three corners of the said outside of the field pattern area and indicating the lowest limits in setting positions of the stepper blades respectively, and forming a predetermined geometrical shape together.

REFERENCES:
patent: 5250983 (1993-10-01), Yamamura

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