Photomask for reconfiguring a circuit by exposure at two differe

Details Photomask for reconfiguring a circuit by exposure at two differe Photomask for reconfiguring a circuit by exposure at two differe

1998-01-06

1999-11-02

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

G03F 900

Patent

active

059767324

ABSTRACT:
A photomask for printing multiple configurations includes a transparent substrate and a patterned opaque layer on a surface of the substrate defining transmitting and non-transmitting portions. A phase shifting layer is provided adjacent the opaque layer and has a depth such that it shifts a light having a first wavelength about 180.degree. and shifts the phase of a second light about 0.degree..

REFERENCES:
patent: 5670281 (1997-09-01), Dai

Affiliated with

Also associated with

Rating

Photomask for reconfiguring a circuit by exposure at two differe does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Photomask for reconfiguring a circuit by exposure at two differe, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photomask for reconfiguring a circuit by exposure at two differe will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2132602