Photomask for producing semiconductor devices

Details Photomask for producing semiconductor devices Photomask for producing semiconductor devices

1981-10-23

1983-09-06

Wintercorn, Richard A.

Photocopying

Contact printing

Frames

355 30, G03B 2728

Patent

active

044026005

ABSTRACT:
A photomask comprises a transparent substrate on one surface of which a mask pattern is formed of a photoshielding film and the opposite surface of which is roughened in order that rays of incident light are refracted diffusedly through the rough surface and the images of minute particles of dust disappear in the projected pattern.

REFERENCES:
patent: 3507593 (1970-04-01), McTeague
patent: 3811893 (1974-05-01), Jannssen et al.

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