Photomask for off-axis illumination and method of...

Details Photomask for off-axis illumination and method of... Photomask for off-axis illumination and method of...

2005-03-15

2005-03-15

Rosasco, S. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

Reexamination Certificate

active

06866968

ABSTRACT:
A photomask that is capable of implementing off-axis illumination (OAI), and a method of fabricating the same, are provided. The photomask includes a transparent substrate, a plurality of opaque patterns formed on the front surface of the transparent substrate, for defining a floodlighting portion for forming patterns, and a plurality of phase gratings formed on the back surface of the transparent substrate, allowing off-axis illumination (OAI) of an incident light source beyond the OAI limit of exposure equipment, allowing use in the outmost region of an aperture, and allowing modified illumination having a shape suitable for the layout of the opaque patterns.

REFERENCES:
patent: 6249335 (2001-06-01), Hirukawa et al.
patent: 9050117 (1997-02-01), None
patent: P1995-0021041 (1995-07-01), None
patent: P1996-059820 (1998-08-01), None
patent: P1998-040598 (1998-08-01), None

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