Photomask for measuring lens aberration, method of its...

Details Photomask for measuring lens aberration, method of its... Photomask for measuring lens aberration, method of its...

2008-07-22

2008-07-22

Punnoose, Roy M (Department: 2886)

Optics: measuring and testing

Lens or reflective image former testing

C430S005000

Reexamination Certificate

active

11388887

ABSTRACT:
A photomask for measuring lens aberration, a method of manufacturing the photomask, and a method of measuring lens aberration using the photomask are provided. In an embodiment, the photomask includes a transparent substrate having first and second surfaces. A reference pattern group and an encoded pattern group are formed on the second surface of the transparent substrate, spaced apart from each other. An aperture that includes a Fresnel zone is formed to face the second surface on the second surface of the transparent substrate. Light throughput and measurement efficiency are improved.

REFERENCES:
patent: 6913858 (2005-07-01), Kim
patent: 2003/0193656 (2003-10-01), Kim
patent: 2004/0214095 (2004-10-01), Nakao
patent: 2006/0121368 (2006-06-01), Wu
patent: 2003-156832 (2003-05-01), None
patent: 2003-0085896 (2003-11-01), None
English language abstract of Korean Publication No. 2003-0085896.
English language abstract of Japanese Publication No. 2003-156832.

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