Photomask for forming small contact hole array and methods...

Details Photomask for forming small contact hole array and methods... Photomask for forming small contact hole array and methods...

2006-04-04

2006-04-04

Young, Christopher G. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

Reexamination Certificate

active

07022438

ABSTRACT:
Photomasks that are used to form a fine contact hole array, a method of fabricating the photomask, and use of the photomask. The photomask includes a transparent substrate; a plurality of line-type opaque patterns being formed on the transparent substrate, for defining floodlighting portions for forming patterns; and phase-shifting regions being arranged on the transparent substrate between the opaque patterns at predetermined intervals, the phase-shifting regions defining floodlighting portions for contact holes. A fine and dense contact hole array can be easily formed using the photomask together with a customized illumination. Therefore, a fine contact hole of a good quality can be formed directly on a photoresist using the photomask without additional processes.

REFERENCES:
patent: 6114095 (2000-09-01), Nakabayashi et al.
patent: 6524751 (2003-02-01), Stanton et al.
patent: 7-064273 (1995-03-01), None
patent: 11-135402 (1999-05-01), None

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