Photomask for forming high resolution photoresist patterns

Details Photomask for forming high resolution photoresist patterns Photomask for forming high resolution photoresist patterns

1994-05-23

1996-06-04

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430321, 430396, G03F 900

Patent

active

055231845

ABSTRACT:
A photomask capable of forming a photoresist pattern including a chrome dot formed at the center of a reticle, adapted to attenuate light exposure energy strength concentrated at the center of the photomask, is disclosed. The chrome dot is capable of compensating for the limited resolution exhibited at edges of the pattern due to an intrinsic wave surging property of light source used and, thus, obtaining a high resolution. The photomask makes it possible to easily obtain a photoresist pattern on a highly integrated semiconductor device.

REFERENCES:
patent: 5288569 (1994-02-01), Lin

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