Photomask for forming contact hole in semiconductor device

Details Photomask for forming contact hole in semiconductor device Photomask for forming contact hole in semiconductor device

2009-12-14

2011-10-04

Huff, Mark F (Department: 1721)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

Reexamination Certificate

active

08029949

ABSTRACT:
Disclosed is a photomask for forming a contact hole arranged on a wafer in a zigzag form along a transverse direction, including: a light transmitting substrate; a main pattern disposed on the light transmitting substrate with a zigzag form as an upper main pattern disposed in a relatively upper portion and a lower main pattern disposed in a relatively lower portion are arranged alternately along a transverse direction; a first lower auxiliary pattern extending in a vertical direction and disposed adjacently to a lower portion of the upper main pattern; a first upper auxiliary pattern extending in a vertical direction and disposed adjacently to an upper portion of the lower main pattern; a second lower auxiliary pattern extending in the transverse direction and connecting the first lower auxiliary patterns with each other; and a second upper auxiliary pattern extending in the transverse direction and connecting the first upper auxiliary patterns with each other.

REFERENCES:
patent: 2003/0027366 (2003-02-01), Dulman et al.
patent: 10-2006-0099607 (2006-09-01), None
patent: 10-2007-0110750 (2007-11-01), None
patent: 10-2008-0029493 (2008-04-01), None
patent: 10-2009-0076138 (2009-07-01), None
KPION machine translation of Park (KR 10-2009-0076138 published Jul. 13, 2009 and filed Jan. 1, 2008).

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