Photomask, focus measurement apparatus and focus measurement...

Details Photomask, focus measurement apparatus and focus measurement... Photomask, focus measurement apparatus and focus measurement...

2006-11-30

2010-06-08

Huff, Mark F (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

C430S311000, C355S055000, C355S077000

Reexamination Certificate

active

07732103

ABSTRACT:
A test photomask includes a first mask pattern and a second mask pattern formed at a center portion of the first mask pattern thereon. The first mask pattern is a pattern with light condensing effect and a nature in which an exposure-dose amount to a transfer object varies in dependence on a focus variation, which is a two-dimensional Fresnel zone pattern here.

REFERENCES:
patent: 2004/0196447 (2004-10-01), Watanabe
patent: 2005/0229148 (2005-10-01), Melvin, III
patent: 2006/0187436 (2006-08-01), Nelson et al.
patent: 2006/0216616 (2006-09-01), Shin et al.
patent: 2004-172600 (2004-06-01), None

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