Photomask electrical monitor for production photomasks

Details Photomask electrical monitor for production photomasks Photomask electrical monitor for production photomasks

2008-04-16

2009-02-17

Rosasco, Stephen (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

C324S699000

Reexamination Certificate

active

07491476

ABSTRACT:
The present invention relates to a method, apparatus, and system for monitoring photomasks used in the production of semiconductor wafers for defects, degradation or a combination thereof. The invention provides an integrated test structure on the photomask itself and a method of positioning the test structure in conjunction with the photomask for a masking layer of an integrated circuit. The integrated test structures provide for an in-situ electrical or electromagnetic monitor on the photomask that doesn't adversely affect the integrated semiconductor devices on the wafers during the lithographic masking process.

REFERENCES:
patent: 6362634 (2002-03-01), Jarvis et al.
patent: 6762434 (2004-07-01), Rumsey et al.
patent: 6835502 (2004-12-01), Hibbs
patent: 6972576 (2005-12-01), Lyons et al.
patent: 2005/0164096 (2005-07-01), Hong et al.
patent: 2006/0234144 (2006-10-01), Watson et al.
patent: 2006/0290919 (2006-12-01), Jahnke et al.
patent: 2007/0132445 (2007-06-01), Liegl
patent: 1302138 (1987-04-01), None
Wagner, Fabrication of a Focus Monitor for Photomasks, TDB v38 n5 May 1995 p. 1-2.

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