Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Reexamination Certificate
2007-02-06
2007-02-06
Rosasco, S. (Department: 1756)
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
C216S059000, C216S066000
Reexamination Certificate
active
10721522
ABSTRACT:
The object of the present invention is to provide a method for solving the problem of surface damage due to gallium ion irradiation that poses a problem when carrying out mask repair using currently established FIB techniques, and the problem of residual gallium, and to provide a device realizing this method. The device of the present invention has an electron beam lens barrel that can carry out processing, as well as an FIB lens barrel, provided inside the same sample chamber, which means that a mask repair method of the present invention, in correction processing to remove redundant sections such as a mask opaque defect, phase shift film bump defect or a glass substrate cut remnant defect, comprises a step of coarse correction by etching using a focused ion beam and a step of finishing processing using an electron beam, to remove surface damage due to gallium irradiation, and residual gallium.
REFERENCES:
patent: 5272116 (1993-12-01), Hosono
patent: 5882823 (1999-03-01), Neary
patent: 6096459 (2000-08-01), Yang
patent: 2003/0215722 (2003-11-01), Kanamitsu et al.
patent: 2004/0151991 (2004-08-01), Stewart et al.
Sugiyama Yasuhiko
Tashiro Junichi
Yasaka Anto
Adams & Wilks
Rosasco S.
SII NanoTechnology Inc.
LandOfFree
Photomask correction method using composite charged particle... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Photomask correction method using composite charged particle..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photomask correction method using composite charged particle... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3844619