Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Patent
1994-01-14
1995-10-03
Rosasco, S.
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
430 22, 430311, 430322, 430396, G03F 900
Patent
active
054551307
ABSTRACT:
According to the inventive photomask, a light shielding pattern is formed at one major surface side of a transparent substrate, and an optical path adjusting film formed at one major surface side and/or the other major surface side of the transparent substrate for adjusting an optical path of light passing between adjacent regions of the light shielding pattern. Thus, the focal point of light passing between the adjacent regions of the light shielding pattern changes along the thickness direction of the resist film corresponding to the irregularity of the resist film, whereby the resist film can be accurately photosensitized in spite of the irregularity thereof.
REFERENCES:
patent: 4906326 (1990-03-01), Amemiya et al.
patent: 5045417 (1991-09-01), Okamoto
patent: 5079113 (1992-01-01), Ohta et al.
Mitsubishi Denki & Kabushiki Kaisha
Rosasco S.
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