Photomask blanks and photomasks prepared therefrom

Details Photomask blanks and photomasks prepared therefrom Photomask blanks and photomasks prepared therefrom

1977-08-15

1979-08-28

Lesmes, George F.

Stock material or miscellaneous articles

Web or sheet containing structurally defined element or...

Physical dimension specified

96 383, 156656, 156659, 428469, 428539, B32B 904

Patent

active

041661486

ABSTRACT:
The photomask blank comprises a transparent substrate, a chromium film directly formed on the substrate and having a thickness of less than 15 m.mu., an intermediate layer formed on the chromium film and containing chromium oxide and a metal mask layer made of chromium and formed on the intermediate layer. The intermediate layer comprises a single chromium oxide film or a composite layer of a chromium oxide film and a pure chromium film or a mixture of chromium and chromium oxide. The photomask is prepared by etching the chromium film, the intermediate layer and the mask layer of the photomask blank described above.

REFERENCES:
patent: 3542612 (1970-11-01), Cashau et al.
patent: 3906133 (1975-09-01), Flutie

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