Photomask blanks and method of preparing the same

Details Photomask blanks and method of preparing the same Photomask blanks and method of preparing the same

1977-09-19

1979-02-13

Mack, John H.

Chemistry: electrical and wave energy

Processes and products

Vacuum arc discharge coating

204192P, 427250, 427255, 428433, C23C 1500, C23C 1302, C23C 1304

Patent

active

041394437

ABSTRACT:
The photomask blank comprises a transparent substrate, a first chromium film formed on the substrate by sputtering, a second chromium film formed on the first chromium film by vacuum evaporation and a chromium oxide film by vacuum evaporation. The relative thickness of the two chromium films and the chromium oxide film is adjusted to improve resolution of a pattern and to decrease reflectance.

REFERENCES:
patent: 3542612 (1970-11-01), Cashau et al.
patent: 3600243 (1971-08-01), La Rocque et al.
patent: 3644134 (1972-02-01), Widmann et al.
patent: 3715244 (1973-02-01), Szupillo
patent: 3892571 (1975-07-01), Simeonov et al.

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