Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Reexamination Certificate
2007-05-15
2007-05-15
Walke, Amanda (Department: 1752)
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
C430S320000, C430S322000, C428S432000
Reexamination Certificate
active
11063830
ABSTRACT:
In obtaining a photomask blank1by disposing a sputtering target in a vacuum chamber and forming thin films3, 4,and5with a three-layer construction of CrN/CrC/CrON over a transparent substrate2by reactive sputtering, the thin films are formed in a mixed gas atmosphere containing helium, and the helium gas flux in the mixed gas is controlled such that the crystal grain diameter of the CrC thin film, which is the thickest film, will be 3 to 7 nm. This yields a photomask blank having thin films with low film stress, having good film quality, and which can be produced at a high yield in mass production.
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Kurt J. Lesker Company, Torus Sputter Sources, “Power Supplies, Monitors/Controllers, Accessories and Materials”; http://www.lesker.com/cfdocs
ewweb/framesets/frameset—downloads.cfm; pp. 1-15.
Mitsui Masaru
Ushida Masao
Yamagata Haruhiko
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