Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Reexamination Certificate
2005-05-31
2005-05-31
Walke, Amanda (Department: 1752)
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
C430S320000, C430S322000, C428S432000, C204S192130, C204S192150
Reexamination Certificate
active
06899979
ABSTRACT:
In obtaining a photomask blank1by disposing a sputtering target in a vacuum chamber and forming thin films3, 4,and5with a three-layer construction of CrN/CrC/CrON over a transparent substrate2by reactive sputtering, the thin films are formed in a mixed gas atmosphere containing helium, and the helium gas flux in the mixed gas is controlled such that the crystal grain diameter of the CrC thin film, which is the thickest film, will be 3 to 7 nm. This yields a photomask blank having thin films with low film stress, having good film quality, and which can be produced at a high yield in mass production.
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Kurt J. Lesker Company, Torus Sputter Source, “Power Supplies, Monitors/Controllers, Accessories and Materials” http://www.lesker.com/cfdocs
ewweb/framesets/frameset_downloads.cfm□□pp. 1-15.
Mitsui Masaru
Ushida Masao
Yamagata Haruhiko
Hoyo Corporation
Oliff & Berridg,e PLC
Walke Amanda
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