Photomask blank, photomask, and methods of manufacturing the...

Details Photomask blank, photomask, and methods of manufacturing the... Photomask blank, photomask, and methods of manufacturing the...

2009-03-31

2011-10-04

Rosasco, Stephen (Department: 1721)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

Reexamination Certificate

active

08029948

ABSTRACT:
A photomask blank has a light shieldable film formed on a light transmitting substrate. The light shieldable film has a light shielding layer which is formed of molybdenum silicide metal containing molybdenum in a content greater than 20 atomic % and not greater than 40 atomic % and which has a thickness smaller than 40 nm, an antireflection layer formed on the light shielding layer in contact with the light shielding layer and formed of a molybdenum silicide compound containing at least one of oxygen and nitrogen, and a low reflection layer formed under the light shielding layer in contact with the light shielding layer.

REFERENCES:
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patent: 2010/0143831 (2010-06-01), Yoshikawa et al.
patent: 2005-345737 (2005-12-01), None
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patent: 2007-241136 (2007-09-01), None

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