Photomask blank manufacturing method

Details Photomask blank manufacturing method Photomask blank manufacturing method

2006-04-11

2006-04-11

Letscher, Geraldine (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

Reexamination Certificate

active

07026077

ABSTRACT:
A method of manufacturing a photomask blank having at least a film for forming a mask pattern on a transparent substrate comprises the steps of causing a sputtering atmosphere to contain at least a helium gas to form a film for forming the mask pattern by sputtering, and heating the transparent substrate during or after the film forming step.

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