Photomask blank and process for making a photomask blank using g

Details Photomask blank and process for making a photomask blank using g Photomask blank and process for making a photomask blank using g

1991-08-08

1993-07-27

McCamish, Marion E.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

427448, G03F 900

Patent

active

052309711

ABSTRACT:
A single pass, multiple target, continuous sputtering process for manufacturing photomask blanks comprising a single masking layer having plural strata of different composition and gradual compositional transitions between strata. Photomask blanks are useful in the process of integrated circuit manufacture.

REFERENCES:
patent: 4363846 (1982-12-01), Kaneki
patent: 4374912 (1983-02-01), Kaneki et al.
patent: 4720442 (1988-01-01), Shinkai et al.

Affiliated with

Also associated with

Rating

Photomask blank and process for making a photomask blank using g does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Photomask blank and process for making a photomask blank using g, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photomask blank and process for making a photomask blank using g will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2341572