Photomask blank and photomask

Details Photomask blank and photomask Photomask blank and photomask

1983-12-27

1985-12-03

O'Keefe, Veronica

Stock material or miscellaneous articles

All metal or with adjacent metals

Composite; i.e., plural, adjacent, spatially distinct metal...

428664, 428666, 428667, 428632, 428633, B32B 900, H01L 21302

Patent

active

045566089

ABSTRACT:
A photomask is fabricated by forming, in a photomask (hard mask) produced by forming a patternized film of a masking material comprising (a) a layer of metallic chromium and (b) a layer of chromium oxides superposed thereon, a film of a translucent and electroconductive material selected from Nb, Ta and V, between the masking film and the transparent substrate. At the time of pattern transferring by photolithography, dropping off of parts of the pattern of this photomask does not occur even when it includes isolated island-like parts, and, at the time of inspection by electron-beam exposure, the precision of inspection does not lower. This photomask is obtained by patternizing by selective etching the masking film of a photomask blank produced by successively forming, on the transparent substrate, the translucent and electroconductive film and the masking film.

REFERENCES:
patent: 3443915 (1969-05-01), Wood et al.
patent: 4342817 (1982-08-01), Bohlen et al.
patent: 4374912 (1983-02-01), Kaneki et al.

Affiliated with

Also associated with

Rating

Photomask blank and photomask does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Photomask blank and photomask, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photomask blank and photomask will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1394467