Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Reexamination Certificate
2011-03-08
2011-03-08
Huff, Mark F (Department: 1721)
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
C430S311000, C430S394000
Reexamination Certificate
active
07901842
ABSTRACT:
It is provided a photomask blank that has good flatness when a light-shielding film is patterned and hence can provide a good mask pattern accuracy and a good pattern transfer accuracy, and a method of producing a photomask.A photomask blank of the present invention includes a light-shielding film containing at least chromium on a light-transmitting substrate. The light-shielding film is formed so as to cause a desired film stress in the direction opposite to that of a change in the film stress that is anticipated to be caused in the light-shielding film by heat treatment according to a resist film formed on the light-shielding film. A photomask is produced by patterning the light-shielding film of the photomask blank by dry etching.
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patent: 2005/0221199 (2005-10-01), Sandstrom
patent: 2005/0238922 (2005-10-01), Kinoshita et al.
patent: 2005/0260505 (2005-11-01), Fukushima et al.
patent: 62-32782 (1982-09-01), None
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patent: 3276954 (2000-02-01), None
patent: 2004-104118 (2004-04-01), None
Iwashita Hiroyuki
Okubo Yasushi
Ushida Masao
Yamada Takeyuki
Alam Rashid
Hoya Corporation
Huff Mark F
Sughrue & Mion, PLLC
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