Photomask and projection exposure mechanism using the same

Details Photomask and projection exposure mechanism using the same Photomask and projection exposure mechanism using the same

1993-10-18

1995-08-15

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430311, 430321, 430396, G03F 900

Patent

active

054418356

ABSTRACT:
A photomask for receiving light for exposure from a light source and projecting the emitted light onto a resist film on a wafer through an optical system so as to pattern the resist film includes a plurality of light transmitting portions for transmitting the light for exposure through a converging portion, and a convex portion made of a transparent or translucent material. The convex portion is formed protruding into the side on which the wafer is provided in order to cover the light transmitting portions so that the light for exposure is emitted as transmitted light which can form an image on the imaging plane of the wafer by utilizing refractive effects.

REFERENCES:
patent: 4952026 (1990-08-01), Bellman et al.
patent: 5079112 (1992-01-01), Berger et al.
"Phase-Shifting Technology Dig." (1991) pp. 58-61.
"Tech. Dig. Int. Electron Device Meeting" (1990) pp. 817-820.

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