Photomask and process of making semiconductor device by the use

Details Photomask and process of making semiconductor device by the use Photomask and process of making semiconductor device by the use

1993-06-21

1995-06-20

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430321, 430322, G03F 900

Patent

active

054260078

ABSTRACT:
A photomask includes square holes formed therein, each of the square holes having sides each of which is located to be parallel or perpendicular to a straight line radially extending between the center of the photomask corresponding to the center of a lens and the center of that hole. By forming the holes in such a manner, the sides of the holes are located in the tangential or sagittal plane such that the effect of aberration can be minimized.

REFERENCES:
patent: 4393127 (1983-07-01), Greschner et al.
Eugene Hecht, Optics, May, 1990, Chapter 6, pp. 226-230.

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