Photomask and photomask blank

Details Photomask and photomask blank Photomask and photomask blank

1981-11-02

1982-12-14

Hess, Bruce H.

Stock material or miscellaneous articles

Structurally defined web or sheet

Discontinuous or differential coating, impregnation or bond

118504, 118505, 156656, 156667, 427164, 427165, 427166, 428209, 428210, 428333, 428432, 428472, 428698, 428702, 430 5, 4272553, B32B 300, B32B 700, G03F 700

Patent

active

043638465

ABSTRACT:
In a low reflection type photomask (hard mask) having a chromium masking film provided, through or without an intermediary low reflection layer, on a transparent substrate and further having a low reflection layer provided on the chromium layer, use is made of a composite layer containing chromium oxide and chromium nitride as the low reflection layer. The composite layer is substantially equal in etching speed to the chromium film, and the photomask obtained is free from image deterioration caused by protrusions such as visors, burrs, or fractures, as observed in the photomasks of the prior art using chromium oxide films, and also has excellent durability.

REFERENCES:
patent: 4096026 (1978-06-01), Takeuchi
patent: 4105468 (1978-08-01), Geshner
patent: 4166148 (1979-08-01), Sakurai
patent: 4178403 (1979-12-01), Sakurai et al.

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