Photomask and photomask blank

Details Photomask and photomask blank Photomask and photomask blank

1981-11-04

1984-04-03

Kittle, John E.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430 11, 430 14, 156652, 156656, 428209, 428469, 428472, G03F 900

Patent

active

044408412

ABSTRACT:
In a photomask (hard mask) blank having a masking film of metallic chromium, chromium oxide, or the like, formed on a transparent substrate, there are interposed between the transparent substrate and the masking film a translucent and electroconductive film made of molybdenum, tantalum or the like and a translucent and chemically resistant protective film made of aluminum oxide, silicon oxide or the like, in the order mentioned from the side of the transparent substrate. The photomask obtained from this photomask blank is free from distortions or defects of transfer patterns caused by generation of electrostatic charges and also exhibits excellent durability in repeated uses, with intermediate repeated chemical washing.

REFERENCES:
patent: T954002 (1977-01-01), Castrucci et al.
patent: 4166148 (1978-08-01), Sakurai
patent: 4178403 (1979-12-01), Sakurai et al.
patent: 4374912 (1983-02-01), Kaneki et al.
patent: 4396683 (1983-08-01), Hatano et al.

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