Photomask and method of using same

Details Photomask and method of using same Photomask and method of using same

1981-07-29

1982-11-30

Hess, Bruce H.

Radiation imagery chemistry: process, composition, or product th

Effecting frontal radiation modification during exposure,...

118504, 118505, 156145, 427164, 427287, 428 38, 428203, 428209, 428210, 428409, 428432, 430 5, G03C 506, G03F 900

Patent

active

043616437

ABSTRACT:
A photomask (30) used to form patterns on a resist coated semiconductor wafer is comprised of a transparent baseplate (31) having a thin metallic pattern (32) thereon; a transparent, planar coverplate (33) in intimate contact with the patterned baseplate (31) and an index matching fluid (34) interposed therebetween.

REFERENCES:
patent: 1985074 (1934-12-01), Bauersfeld
patent: 2175343 (1939-10-01), Cunningham et al.
patent: 2317550 (1943-04-01), Ormond
patent: 3193840 (1965-07-01), Mercer
patent: 3400995 (1968-09-01), Borberg et al.
patent: 3906133 (1975-09-01), Flutie
patent: 4201581 (1980-05-01), Thomas et al.
patent: 4256787 (1981-03-01), Shaver et al.

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