Photomask and method of fabricating the same

Details Photomask and method of fabricating the same Photomask and method of fabricating the same

2011-03-08

2011-03-08

Huff, Mark F (Department: 1721)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

Reexamination Certificate

active

07901849

ABSTRACT:
A photomask comprises: a light transmitting substrate; patterns disposed over the light transmitting substrate to define a light transmitting region; and a light transmittance control layer disposed between the light transmitting substrate and the patterns having a relatively high light transmittance in a first control layer region overlapping a first portion of the light transmitting region adjacent to a poor pattern having a size larger than a normal size than in a second control layer region overlapping a second portion of the light transmitting region between normal patterns having a normal size.

REFERENCES:
patent: 7060400 (2006-06-01), Wang et al.
patent: 7465524 (2008-12-01), Park et al.
patent: 2008/0187841 (2008-08-01), Wang

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