Photomask and method of exposure using same

Details Photomask and method of exposure using same Photomask and method of exposure using same

1998-10-29

2000-11-21

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

G03F 900

Patent

active

061500593

ABSTRACT:
A photomask has a plurality of main holes which pass a prescribed light beam that is shone onto positions that make up a plurality of pattern parts, at locations that are opposite a plurality of pattern parts for said semiconductor device, this photomask also having a plurality of minute auxiliary holes, which pass a light beam of a degree that is not transferred at the time of exposure, these auxiliary holes being disposed between the main holes.

REFERENCES:
patent: 5418093 (1995-05-01), Asai et al.

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