Photomask and method for reducing electrostatic discharge on...

Details Photomask and method for reducing electrostatic discharge on... Photomask and method for reducing electrostatic discharge on...

2005-05-17

2005-05-17

Rosasco, S. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

C428S014000

Reexamination Certificate

active

06893780

ABSTRACT:
A photomask and method for reducing electrostatic discharge on the photomask with an ESD protection pattern are disclosed. A photomask includes a substrate and a patterned layer formed on at least a portion of the substrate. The patterned layer includes an electrostatic discharge (ESD) patterned formed between an outer perimeter of an active region and an inner perimeter of a frame region. The ESD pattern reduces ESD effects in the patterned layer.

REFERENCES:
patent: 5989754 (1999-11-01), Chen et al.
patent: 6180291 (2001-01-01), Bessy et al.
patent: 6309781 (2001-10-01), Gemmink et al.
patent: 6440617 (2002-08-01), Deng et al.

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