Photomask and method for manufacturing the same

Details Photomask and method for manufacturing the same Photomask and method for manufacturing the same

2006-06-06

2006-06-06

Young, Christopher G. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

C430S014000, C430S330000, C427S314000, C427S372200

Reexamination Certificate

active

07056623

ABSTRACT:
A photomask and method for manufacturing the same are disclosed. A first material is deposited on at least a portion of a substrate to form a first material layer. Before completion of the deposition of the first material, a thermal treatment is applied to the substrate at a temperature greater than approximately 300 degrees Celsius.

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patent: 6228540 (2001-05-01), Kobayashi
patent: 6242136 (2001-06-01), Moore et al.
patent: 6255225 (2001-07-01), Yamada et al.
patent: 6558855 (2003-05-01), Tanaka et al.
International Search Report PCT/US 03/02281.

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