Photomask and method for manufacturing a semiconductor...

Details Photomask and method for manufacturing a semiconductor... Photomask and method for manufacturing a semiconductor...

2011-02-08

2011-02-08

Huff, Mark F (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Registration or layout process other than color proofing

C430S319000, C430S394000

Reexamination Certificate

active

07883823

ABSTRACT:
A method of manufacturing a semiconductor device that includes: a first exposing step using a photomask in a first area of a semiconductor substrate; and a second exposing step using the photomask in a second area adjacent to the first area of the semiconductor substrate. The photomask includes a first transmitting pattern having a ring shape that is missing a part, and a supplemental second transmitting pattern having a shape corresponding to the missing part of the first transmitting pattern, so that a closed loop pattern is exposed by the first exposing step and the second exposing step on the semiconductor substrate.

REFERENCES:
patent: 5989754 (1999-11-01), Chen et al.
patent: 6291114 (2001-09-01), Reijers
patent: 5-100410 (1993-04-01), None
patent: 2000-131823 (2000-05-01), None
patent: 2002-532758 (2002-10-01), None

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