Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Reexamination Certificate
2007-12-04
2007-12-04
Young, Christopher G. (Department: 1756)
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
C430S022000
Reexamination Certificate
active
11592149
ABSTRACT:
A photomask includes a main mask pattern having first chip patterns and having a first size corresponding to a maximum exposure area of a projection exposure apparatus. The mask further includes a sub-mask pattern having second chip patterns different from the first chip patterns, having a second size smaller than the first size, and arranged adjacently to the main mask pattern.
REFERENCES:
patent: 7150948 (2006-12-01), Maruko
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patent: 9-134870 (1997-05-01), None
patent: 11-305418 (1999-11-01), None
Oki Electric Industry Co. Ltd.
Wenderoth , Lind & Ponack, L.L.P.
Young Christopher G.
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