Photomask and method for exposing chip pattern

Details Photomask and method for exposing chip pattern Photomask and method for exposing chip pattern

2006-12-19

2006-12-19

Young, Christopher G. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Registration or layout process other than color proofing

C430S312000

Reexamination Certificate

active

07150948

ABSTRACT:
A photomask includes a main mask pattern having first chip patterns and having a first size corresponding to a maximum exposure area of a projection exposure apparatus. The mask further includes a sub-mask pattern having second chip patterns different from the first chip patterns, having a second size smaller than the first size, and arranged adjacently to the main mask pattern.

REFERENCES:
patent: 1-239555 (1989-09-01), None
patent: 2-127640 (1990-05-01), None
patent: 6-20911 (1994-01-01), None
patent: 9-134870 (1997-05-01), None
patent: 11-305418 (1999-11-01), None

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