Photomask and method for evaluating an initial calibration...

Details Photomask and method for evaluating an initial calibration... Photomask and method for evaluating an initial calibration...

2005-03-01

2005-03-01

Young, Christopher G. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

C430S030000, C430S296000, C430S942000, C382S144000

Reexamination Certificate

active

06861181

ABSTRACT:
A photomask and method for evaluating an initial calibration for a scanning electron microscope are disclosed. The method includes generating an initial calibration for a SEM that contains a target width for a feature on a reference target and measuring the feature on the reference target in the SEM to determine a measured width for the feature. The measured width is compared to the target width to generate a shift deviation and a current calibration for the SEM is adjusted based on the shift deviation.

REFERENCES:
patent: 6573497 (2003-06-01), Rangarajan et al.
patent: 6635874 (2003-10-01), Singh et al.
Presentation at SPIE Lithography Conference Entitled “Photomask Critical Dimension Metrology”, St. Johns, Virgin Islands, 28 Pages, Dec. 8, 2000.

Affiliated with

Also associated with

Rating

Photomask and method for evaluating an initial calibration... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Photomask and method for evaluating an initial calibration..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photomask and method for evaluating an initial calibration... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3448722