Photomask and method for detecting violations in a mask...

Details Photomask and method for detecting violations in a mask... Photomask and method for detecting violations in a mask...

2005-05-31

2005-05-31

Rosasco, S. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

Reexamination Certificate

active

06899981

ABSTRACT:
A photomask and method for detecting failures in a mask pattern file using a manufacturing rule are disclosed. The method includes calculating a manufacturing rule based on a design parameter associated with a manufacturing process and measuring a dimension of a non-linear feature in a mask pattern file. A rule violation is identified in the mask pattern file if the measured dimension is less than the calculated manufacturing rule.

REFERENCES:
patent: 2002/0112222 (2002-08-01), Fischer et al.
patent: 2003/0061583 (2003-03-01), Malhotra

Affiliated with

Also associated with

Rating

Photomask and method for detecting violations in a mask... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Photomask and method for detecting violations in a mask..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photomask and method for detecting violations in a mask... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3400099